I am new to the world of computer vision, so please excuse my basic questions.
I have two patterns: one consisting of a single circle of radius $r$, and one made of several circles, still of radius $r$, placed in an array fashion.
These two patterns are etched into two separate masks and let light shines through the circular aperture, and the filtered light is shone into a CMOS. The goal is to obtain the translation of the pattern on the CMOS in terms of {x,y,z}, which is dependent on the angle of the incident light through the mask.
My questions are:
What is the improvement, in terms of accuracy, that can be obtained by having one circle vs having an array of circles of the same radius? Is there a formula describing this improvement? I believe it is a function of the number of features, but also somewhat related to how they are mutually placed
What is the fastest way to perform pattern matching? (since I manufactured the mask, I know exactly the radius of the circles and the pitch at which they are placed in the array)
What would be a smart way to design such a multi-feature pattern in order to maximize precision?